J. Phys. Radium
Volume 17, Numéro 3, mars 1956
Page(s) 179 - 183
J. Phys. Radium 17, 179-183 (1956)
DOI: 10.1051/jphysrad:01956001703017900

Techniques de production de films métalliques minces par condensation de vapeur

E.C. Crittenden et R.W. Hoffman

Purity of the material, protection from chemical reaction with residual gas after deposition, crystal size and preferred orientation, crystal imperfections, mechanical stress, roughness and agglomeration are discussed. The transition metals are well behaved, the noble metals poor, and Zn, Cd and Hg very difficult to deal with as regards producing smooth surfaced films down to a few atoms thick. Results for Cu and Ni are reported in some detail.

6855 - Thin film structure and morphology.

Key words
condensation -- copper -- evaporation -- films -- metals -- nickel