Numéro |
J. Phys. Radium
Volume 17, Numéro 3, mars 1956
|
|
---|---|---|
Page(s) | 179 - 183 | |
DOI | https://doi.org/10.1051/jphysrad:01956001703017900 |
J. Phys. Radium 17, 179-183 (1956)
DOI: 10.1051/jphysrad:01956001703017900
6855 - Thin film structure and morphology.
Key words
condensation -- copper -- evaporation -- films -- metals -- nickel
DOI: 10.1051/jphysrad:01956001703017900
Techniques de production de films métalliques minces par condensation de vapeur
E.C. Crittenden et R.W. Hoffman Abstract
Purity of the material, protection from chemical reaction with residual gas after deposition, crystal size and preferred orientation, crystal imperfections, mechanical stress, roughness and agglomeration are discussed. The transition metals are well behaved, the noble metals poor, and Zn, Cd and Hg very difficult to deal with as regards producing smooth surfaced films down to a few atoms thick. Results for Cu and Ni are reported in some detail.
6855 - Thin film structure and morphology.
Key words
condensation -- copper -- evaporation -- films -- metals -- nickel