J. Phys. Radium
Volume 17, Numéro 3, mars 1956
|Page(s)||213 - 219|
Contribution à l'étude de la conduction électrique des couches métalliques minces aux basses températuresB. Vodar
Laboratoire des Hautes Pressions, Bellevue (S.-et-O.), (France)
The data described in this paper have been obtained with Mostovetch, Feldman et Romand at the Laboratory of Prof. E. Darmois during the last years. The paper contains the following main experiments : 1) experimental methods for obtaining stable and clean metallic layers on glass, a few atoms thick. 2) Measurement of the D C resistance of these layers down to 4,2° K. The results concern : 1) the variation with the temperature, implying a small activation energy; 2) effect of adsorbed gases, which decrease the resistance. 3) effect of applied potential expressed by a linear relation between log R(F) et F½, F being the average field ; 4) effect of a dielectric layer on the field effect ; 5) field effect for low fields and for strong fields (saturation). The origin of the observed phenomena are briefly discussed. The activation energy may be due to the potential wall between particles or atomes; the field effect is then a modified form of the Shottky effect ; the adsorbed gases may reduce the height of the wall. The small value of the activation energy is possibly due to the fact that the electron never escape far enough from the particles. Another origin for the activation energy is connected with the surface states and the possible gap between Brillouin zones in a 2 dimensional array.
6855 - Thin film structure and morphology.
electrical conductivity -- films -- low temperature phenomena -- metal theory