Numéro |
J. Phys. Radium
Volume 17, Numéro 3, mars 1956
|
|
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Page(s) | 237 - 240 | |
DOI | https://doi.org/10.1051/jphysrad:01956001703023700 |
J. Phys. Radium 17, 237-240 (1956)
DOI: 10.1051/jphysrad:01956001703023700
Laboratoire des Hautes Pressions, Bellevue (S.-et-O.) (France)
6855 - Thin film structure and morphology.
Key words
electrical conductivity -- films -- metal theory -- work function
DOI: 10.1051/jphysrad:01956001703023700
Étude de la conduction électrique des couches métalliques minces en haute fréquence
Offret et B. VodarLaboratoire des Hautes Pressions, Bellevue (S.-et-O.) (France)
Abstract
The electrical resistance of thin films evaporated on glass decreases with increasing frequencies ; the variation is more important at very low temperatures. This effect is accounted for the. existence of capacities between aggregates. This measures at high frequencies can give informations about metallic conduction within grains, while measurements with direct current inform about the work fonction of electrons.
6855 - Thin film structure and morphology.
Key words
electrical conductivity -- films -- metal theory -- work function