Numéro |
J. Phys. Radium
Volume 17, Numéro 3, mars 1956
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|
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Page(s) | 274 - 277 | |
DOI | https://doi.org/10.1051/jphysrad:01956001703027400 |
J. Phys. Radium 17, 274-277 (1956)
DOI: 10.1051/jphysrad:01956001703027400
Research Institute for scientific measurement, Tohoku University, Sendai, Japon
6855 - Thin film structure and morphology.
Key words
films -- electric resistance -- tellurium
DOI: 10.1051/jphysrad:01956001703027400
Propriétés des lames évaporées de tellure
T. SakuraiResearch Institute for scientific measurement, Tohoku University, Sendai, Japon
Abstract
Tellurium films deposited on a substrate kept at room temperature are composed of micro-cristals and amorphous portions ; while those deposited on a hot substrate are well cristallized. Resistivity of the films is much affected by amorphous portions. From the measurements of the infra-red absorption, the energy state of micro-cristal has been found to be nearly the same as that of the bulk cristal. The amorphous deposit seems to change its energy state by absorbing various kind of gas.
6855 - Thin film structure and morphology.
Key words
films -- electric resistance -- tellurium