J. Phys. Radium
Volume 17, Numéro 3, mars 1956
Page(s) 298 - 305
J. Phys. Radium 17, 298-305 (1956)
DOI: 10.1051/jphysrad:01956001703029800

Application des couches métalliques minces à la réalisation de résistances électriques en particulier de résistances électriques de valeurs élevées

B. Vodar

Laboratoire des Hautes Pressions Bellevue (S.-et-O.) (France)

Conditions are described under which thin metallic layers on glass may be used as good resistors. The importance of refractory and noble metal is shown. Some data are given on the properties of thin layers resistors : temperature coefficient (which may be widely varied) ; voltage coefficient (almost negligible) power dissipation ; stability (order of 0,1 %). Are presented some practical devices for making different types of resistors by evaporation under vacuum : In order to use a thicker layer long et narrow films are employed ; procedures in order to make layers of such a shape are given. A brief description is presented of an interrupted vacuum arc where the evaporated metal is ionised and may be concentrated by an electric field on the usefull area; this arc is especially interesting for the practical evaporation of high melting metals.

6855 - Thin film structure and morphology.

Key words
films -- electric resistance